The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 02, 1999
Filed:
Jan. 31, 1996
Applicant:
Inventors:
Pierre V Calderini, Montigny Sur Loing, FR;
Thierry L Dannoux, Avon, FR;
Assignee:
Corning Incorporated, Corning, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29D / ;
U.S. Cl.
CPC ...
264-25 ; 216 24 ; 216 26 ; 264-11 ;
Abstract
Preferential etching techniques are used to form a mold which can then be used to mold a microlens array. A mask (4.sub.i) made of a material which is resistant to a chemical composition for etching the plate is formed on a substrate, so that the mask is in the form of a grid with generally polygonal meshes each centered over one of the desired cells. The sides of each cell of the mask has outgrowths (5.sub.j) extending towards the center of desired cells. The substrate is subjected to the etching composition.