The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 02, 1999

Filed:

Apr. 25, 1997
Applicant:
Inventors:

Mark A Church, Los Gatos, CA (US);

Alain Michael DeSouches, Santa Cruz, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B / ;
U.S. Cl.
CPC ...
451-5 ; 451 10 ;
Abstract

Disclosed is an apparatus and method for calibrating the deposition windage of deposited thin film resistive elements, such as magnetoresistive read elements for magnetic heads which are to be lapped, comprising one set of at least three resistive elements having different nominal height dimensions, a resistance detector for measuring the resistance of each of the resistive elements, and a windage calculator responsive to the nominal height dimensions and to the measured resistances of each of the resistive elements for calculating the windage of the one set of resistive elements.


Find Patent Forward Citations

Church, Mark. (1999). Deposition process windage calibration (U.S. Patent No. 5876264). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5876264

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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