The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 02, 1999
Filed:
Jun. 16, 1997
Applicant:
Inventors:
Masato Tanaka, Shiga-ken, JP;
Teruyuki Kobayashi, Shiga-ken, JP;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B / ;
U.S. Cl.
CPC ...
134182 ; 134902 ;
Abstract
A substrate treating apparatus adapted for treating a substrate with treating fluid therein, the substrate treating apparatus includes a processing bath; a baffle plate with a plurality of holes disposed therein for dividing the processing bath into an upper region and a lower region, the holes allowing communication of the treating liquid between the upper region and the lower region. The baffle plate is composed of a material exhibiting a property that the contact angle of a bubble generated in the treating liquid with respect to the baffle plate is smaller than a predetermined value.