The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 23, 1999

Filed:

Dec. 11, 1996
Applicant:
Inventors:

Cheol-Jung Kim, Daejeon-Si, KR;

Kwang-Suk Kim, Daejeon-Si, KR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01J / ; G01J / ;
U.S. Cl.
CPC ...
356121 ; 356402 ; 356419 ;
Abstract

A method and system is disclosed in which the local variation of an extended radiation source is monitored with single-element detector. The chromatic aberration of the imaging optics induces the different transmittance curves for different wavelengths, and the different shape in the transmittance curve is used as a spatial filter which is multiplied to the chromatic intensity profile of the extended radiation source to detect the local variation in the intensity profile of the extended radiation source. The signal processing of the chromatic signals is implemented to detect the size variation and the environmental effects on the extended radiation source. A fiber is also used for remote operation.


Find Patent Forward Citations

Kim, Cheol-Jung. (1999). Method and system for spatial filtering of an extended radiation source (U.S. Patent No. 5875026). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5875026

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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