The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 23, 1999
Filed:
Mar. 11, 1997
Suk-Bin Han, Chungcheongbuk-do, KR;
LG Semicon Co., Ltd., Chungcheongbuk-do, KR;
Abstract
A wet treatment device for bathing a semiconductor wafer in a processing solution is disclosed. The device includes a processing tank, a discharge ditch around the processing tank, a flow control board located in the processing tank, a supply line supplying processing solution to the processing tank, and a discharge line carrying away processing solution from the discharge ditch. Any two walls in the device are connected in a curved surface having an arc sufficient to reduce accumulation of contaminant matter at the curved surface. A line connects to a wall in a curved annular surface any two walls having an arc sufficient to reduce abrasion at the curved annular surface. The curved surface can be substituted with an approximation of a curved surface so long as the approximation has an arc sufficient to reduce accumulation/abrasion.