The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 16, 1999

Filed:

Aug. 14, 1997
Applicant:
Inventors:

Pei-Ing Paul Lee, LaGrangeville, NY (US);

William Alan Klaasen, Underhill, VT (US);

Alexander Mitwalsky, Poughkeepsie, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
257529 ; 257637 ; 257638 ; 257665 ;
Abstract

A fuse window structure and method for forming the same for a semiconductor device with a fuse and a cutting site on the fuse, the structure having (1) a first oxide region substantially in register with the cutting site, the first oxide region having a first thickness, (2) a second oxide region substantially in register with a first land generally surrounding the cutting site, the first land generally in register with the fuse, the second region having a second thickness, and (3) a third oxide region substantially in register with a second land generally surrounding the fuse, the third region having a third thickness different than the first thickness. Different fuse window structures are formed by using etch stops with different configurations, each configuration differing with regard to coverage of the three oxide regions.


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