The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 1999
Filed:
May. 20, 1996
Peter Roth, Eppstein, DE;
Regina Witt, Bad Vilbel, DE;
Joachim Burschapers, Hattersheim, DE;
Norbert Schadler, Stockstadt, DE;
Hoechst Aktiengesellschaft, Frankfurt, DE;
Abstract
The invention relates to a process for the purification of an inert gas by subjecting the inert gas to a sorption treatment, especially gas scrubs. The invention comprises compressing the inert gas to a higher pressure before the sorption treatment, performing the sorption treatment at this higher pressure, and then expanding the purified inert gas. The advantages of the process of the invention can be seen to be essentially that, for example, streams of waste air which contain as impurities volatile solvents such as methyl chloride, isopropyl chloride, or dichloromethane, can be cleaned up with low consumption of energy and scrubbing liquid. Correspondingly, the equipment can have smaller dimensions.