The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 16, 1999

Filed:

Feb. 24, 1997
Applicant:
Inventors:

Bradley E Reis, Wilmington, DE (US);

Steven C Hoover, Wilmington, DE (US);

Keith D Adkins, Elkton, MD (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B26D / ;
U.S. Cl.
CPC ...
83 24 ; 83 27 ; 83 98 ; 83100 ;
Abstract

A method and apparatus is provided for dimensioning and manipulating a patterned material by selectively applying a vacuum and/or positive pressure to the patterned material.


Find Patent Forward Citations

Reis, Bradley. (1999). Vacuum fixture and method for dimensioning and manipulating materials (U.S. Patent No. 5870937). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5870937

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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