The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 09, 1999
Filed:
Dec. 21, 1995
Applicant:
Inventors:
Gijsbertus HW.M. Meulendijks, Eindhoven, NL;
Sebastianus NG. Cuppen, Eindhoven, NL;
Hendrikus L Vandijck, Eindhoven, NL;
Johannes MA.A. Compen, Eindhoven, NL;
Assignee:
U.S. Philips Corporation, New York, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
427 64 ; 427 68 ; 427165 ; 427162 ; 427106 ; 4271262 ; 4271263 ; 427230 ; 427348 ; 4273855 ;
Abstract
Method for manufacturing a glass substrate with reduced glare wherein a suspension comprising sub-micron transparent oxide particles and a binder is coated on the substrate to form a film, whereafter the film is dried in such manner that in situ flocculation of the particles takes place. Said in-situ flocculation strongly reduces glare on the said surface.