The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 09, 1999
Filed:
Nov. 08, 1996
Applicant:
Inventor:
David B Noddin, Eau Claire, WI (US);
Assignee:
W. L. Gore & Associates, Inc., Newark, DE (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C / ;
U.S. Cl.
CPC ...
216 18 ; 216 20 ; 216 65 ; 428209 ;
Abstract
A method of forming a via in a laminated substrate by placing a first mask between an output optics of a laser and an exposed surface of a laminated substrate. The first mask has a first aperture corresponding to a location of a via in the substrate. A second mask is placed between the first mask and the output optics of the laser. The second mask has a second aperture disposed within a main beam of a laser beam output from the laser and blocks side lobes of the laser beam from reaching the exposed surface of the substrate.