The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 09, 1999
Filed:
Oct. 20, 1997
Martin Koch, Neuenburg/Baden, DE;
Gunter Untch, Mullheim/Baden, DE;
GEI GmbH, Deutschland, DE;
Abstract
A proportioning mechanism for controlling a gravitational discharge of flowable material through a passage formed of a sealing material. The mechanism includes a rotatable flap valve mounted in the passage for movement in a first range of movement while in contact with the sealing material, and a second range of movement while out of contact with the sealing material. In the second range, a free flow of material is established. The free flow is terminated when only a small amount of material is yet to be discharged in order to achieve the desired discharge weight. At that time, the flap valve is rotated to a position in contact with a flexible portion of the sealing material. Fluid pressure in a cavity situated adjacent that flexible portion is varied to oscillate the flexible portion into and out of contact with the flap valve. When the flexible portion is out of contact with the flap valve, a gap is formed which admits passage of a small amount of material.