The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 1999
Filed:
Jul. 23, 1996
Applicant:
Inventors:
Kevin John Robbie, Edmonton, CA;
Michael Julian Brett, Edmonton, CA;
Assignees:
The Governors of the University of Alberta, Edmonton, CA;
Alberta Microelectronic Corporation, Edmonton, CA;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
427256 ; 4272481 ; 4272555 ;
Abstract
A method of making vapor deposited thin films by rotating a substrate in the presence of an obliquely incident vapor flux. The substrate may be rotated about an axis normal to the surface of the substrate and/or parallel to the surface of the substrate by two motors mounted with their axes orthogonal to each other. Angle of incidence, measured from the normal to the surface of the substrate, exceeds 80.degree.. Feedback from a deposition rate monitor allows control of rotation speed of both motors to produce a growth with a defined pattern.