The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 1999
Filed:
Jun. 19, 1996
Applicant:
Inventors:
Ronald A Carpio, Austin, TX (US);
Rahul Jairath, San Jose, CA (US);
Jayashree Kalpathy-Cramer, Milpitas, CA (US);
Assignee:
Sematech, Inc., Austin, TX (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C09K / ;
U.S. Cl.
CPC ...
252 791 ; 2521861 ; 2521871 ; 2521872 ; 25218731 ; 25218643 ; 252 792 ; 438692 ; 216 89 ; 216100 ; 216102 ;
Abstract
Buffered slurries are used in a semiconductor process for chemical mechanical polishing of metal layers, such as aluminum or titanium. The slurries may comprise an oxidant capable of causing a passive oxide film to form on a metal based layer. The oxidant may comprise a diluent and may be optionally formulated with a separate oxidizing agent, such as ammonium peroxydisulfate. The slurries may include a buffer that maintains a slurry pH where the passive metal oxide film is stable. This pH may be between about 4 and about 9.