The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 1999
Filed:
Apr. 02, 1997
William R Nelson, Mountlake Terrace, WA (US);
Other;
Abstract
A gas treatment system for liquids can increase gas exposure and contact time. A liquid stream into which treatment gas is added is directed into a vortex chamber (130). The vortex chamber (130) creates a downward spiral flow of the liquid stream forcing it into an upper end inlet (145) of a contact tank (114). The liquid stream with entrained gas bubbles is forced to move downwardly through the tank to a lower end outlet (122). The flow then moves upwardly to a degassing chamber (146) wherein the treatment gas is separated from the liquid and delivered through an outlet (124) for use. Because the entrained bubbles are forced downwardly through the contact tank (114), the gas bubbles remain quite small and contact time is prolonged. Release of the treatment gas is further facilitated by positioning the degassing chamber (146) at an elevated position which promotes gas bubble expansion, combination and release.