The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 1999
Filed:
Dec. 26, 1995
Masahide Yokoyama, Hirakata, JP;
Hiroshi Hayata, Katano, JP;
Seiichiro Mori, Neyagawa, JP;
Toshiyuki Suemitsu, Mino, JP;
Eiji Ohno, Hirakata, JP;
Matsushita Electric Industrial Co., Ltd., Kadoma, JP;
Abstract
A magnetron sputtering apparatus has a plurality of ring-shaped flat targets with different diameters disposed about one center axis. The apparatus includes magnets having the same polarity as each other and placed on both front surface side and rear surface side of each of the targets along an inner circumferential edge thereof, and magnets having the same polarity as each other and placed on both front surface side and rear surface side of each of the targets along an outer circumferential edge thereof. The magnets placed along the inner and outer circumferential edges are placed in such a way that the magnets along the inner circumferential edge and the magnets along the outer circumferential edge become opposite in polarity to each other.