The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 02, 1999

Filed:

Aug. 20, 1997
Applicant:
Inventor:

Ron J Nagahara, San Jose, CA (US);

Assignee:

LSI Logic Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B / ; H01L / ;
U.S. Cl.
CPC ...
451 10 ; 451 11 ; 451 41 ; 451285 ; 451288 ; 438691 ; 438692 ;
Abstract

An apparatus and method are presented for polishing removal of a select amount of material from a surface of a semiconductor wafer. The apparatus includes a polishing pad having a moveable planar polishing surface. The surface of the semiconductor wafer and a surface of at least one sacrificial member are retained against the polishing surface. A measurement system determines an amount of material removed from the surface of the sacrificial member. The measurement system includes a sensor unit for each sacrificial member coupled to a computational device. Each sensor unit is used to determine the amount of material remaining at the surface of the corresponding sacrificial member. The computational device determines the amount of material removed from the surface of each sacrificial member based upon the amount of material remaining at the surface. The amount of material removed from the surface of the sacrificial member corresponds to an amount of material removed from the surface of the semiconductor wafer. The computational device uses a correlation between the material removal rates due to polishing (i.e., polish rates) of the sacrificial member and the material upon the surface of the semiconductor wafer to determine when a desired amount of material has been removed from the surface of the semiconductor wafer.


Find Patent Forward Citations

Nagahara, Ron. (1999). Apparatus and method for polish removing a precise amount of material (U.S. Patent No. 5865666). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5865666

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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