The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 26, 1999
Filed:
Aug. 21, 1997
Junichi Nakai, Fukuyama, JP;
Sharp Kabushiki Kaisha, Osaka, JP;
Abstract
A semiconductor device in accordance with the present invention has a passivation film. The passivation film is provided on the entire surface of a substrate provided with a bonding pad and a scribe line. After applying a photoresist on the entire surface of the passivation film, a photoresist pattern is contoured. The photoresist pattern thus contoured is exposed and developed so as to be patterned. The photoresist is patterned so as to (1) provide an opening which is a connected region of a region to be the bonding pad and a region to be the scribe line, and (2) make angles of the patterning obtuse angles. Then, the passivation film is etched, and the photoresist is removed. With this arrangement, a removing solution and a resist residue do not remain in the opening section provided on a portion of the passivation film corresponding to the bonding pad, thereby preventing a quality deterioration such as corrosion of the bonding pad and breakage of wire bonding.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile