The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 26, 1999

Filed:

Jun. 26, 1996
Applicant:
Inventors:

Hiroji Kawai, Kanagawa, JP;

Tsunenori Asatsuma, Kanagawa, JP;

Kenji Funato, Kanagawa, JP;

Assignee:

Sony Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
438 47 ; 438479 ; 438483 ; 438503 ; 148D / ; 148D / ;
Abstract

A method for growing a single crystal III-V compound semiconductor layer, in which grown by vapor deposition on a first single crystal III-V compound semiconductor layer including at least Ga and N is a second single crystal III-V compound semiconductor layer different from the first layer and including at least Ga and N, comprises the steps of: growing a buffer layer other than single crystal and having substantially the same composition as that of the second layer by vapor deposition on the first layer; and growing the second layer on the buffer layer. A method for growing a single crystal AlGaN layer on a single crystal GaN layer by vapor deposition, comprises the steps of: growing a buffer layer of a III-V compound semiconductor including at least Ga and N on the single crystal GaN layer by vapor deposition; and growing the single crystal AlGaN layer on the buffer layer by vapor deposition. A method for growing single crystal III-V compound semiconductor layers, in which a first single crystal III-V compound semiconductor layer including at least Ga and N and a second single crystal III-V compound semiconductor layer different from the first layer and including at least Ga and N are grown on a substrate by vapor deposition, comprises the step of: growing a buffer layer of a III-V compound semiconductor including at least Ga and N between the first layer and the second layer.


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