The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 26, 1999
Filed:
Oct. 17, 1996
Hirofumi Ichinose, Tsuzuki-gun, JP;
Ippei Sawayama, Machida, JP;
Akio Hasebe, Nagahama, JP;
Tsutomu Murakami, Nara, JP;
Masaya Hisamatsu, Kawasaki, JP;
Satoshi Shinkura, Tsuzuki-gun, JP;
Yukie Ueno, Nara, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A method for etching an object having a portion to be etched on the surface thereof, comprising a step of immersing said object in an electrolyte solution such that said object serves as a negative electrode; a step of arranging a counter electrode having a pattern corresponding to a desired etching pattern to be formed at said portion to be etched of said object in said electrolyte solution so as to maintain a predetermined interval between said counter electrode and said object, and a step of applying a direct current or a pulse current between said object and said counter electrode to etch said portion to be etched of said object into a pattern corresponding to said pattern of said counter electrode.