The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 19, 1999
Filed:
Mar. 27, 1996
Mindy Bokser, San Francisco, CA (US);
Leonard Pon, Los Altos, CA (US);
Jun Yang, Sunnyvale, CA (US);
Kenneth Choy, San Jose, CA (US);
Caere Corporation, Los Gatos, CA (US);
Abstract
A pattern recognition system classifies images of patterns in which the definition of individual features of the pattern may have become blurred. The image is segmented into pieces of arbitrary size and shape, and various combinations are examined to determine those which represent the most likely segmentation of the pattern into its individual features. These individual features are then classified, according to known techniques. Through the use of a second order Markov model, not all possible combinations of pieces need to be examined, to determine the best ones. Rather, the examination of various combinations is limited in accordance with previously determined information, to thereby render the process more efficient. By combining multiple, independently determined probabilities, the accuracy of the overall operation is enhanced.