Electrostrictive actuated mirror array and method for the manufacture

Abstract

An array of M.times.N electrostrictive actuated mirrors for use in an optical projection system is prepared by using a relatively thick (100-150 .mu.m) electrostrictive ceramic wafer whose mechanical properties remain intact, which in turn facilitates the manufacturing process, comprising the steps of: (a) preparing a ceramic wafer made of an electrostrictive material, having top and bottom surfaces; (b) providing on the top surface of the ceramic wafer M vertically oriented first trenches; (c) filling the M trenches with an electrically conductive material; (d) providing N-1 horizontally oriented grooves; (e) covering the top surface, including the N-1 grooves thereon, with a layer of a dielectric material; (f) mounting the ceramic wafer on an active matrix; (g) providing a metallic layer on the bottom surface of the ceramic wafer; (h) forming a photoresistive layer on top of the metallic layer; (i) forming on the ceramic wafer N-1 horizontally oriented cuts, thereby forming an array of M.times.N actuating members; (j) forming on the ceramic wafer M vertically oriented second trenches; (h) removing the photoresistive layer; (l) placing an array of M.times.N hinges; (m) forming a mirror on each of the M.times.N hinges; and (n) making electrical connections to thereby form an array of M.times.N electrostrictive actuated mirrors.