The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 19, 1999
Filed:
Nov. 27, 1996
Applicant:
Inventor:
Ting Yen, Fremont, CA (US);
Assignee:
Cypress Semiconductor Corp., San Jose, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
257776 ; 257773 ; 257905 ; 438637 ; 438621 ; 438618 ; 438633 ;
Abstract
A conducting trench in a dielectric layer can function as both (a) a plurality of contacts and (b) an interconnect in a semiconductor device. The conducting trench may be made by depositing a conductor in a trough formed in a dielectric layer of the device.
Quick Actions:
Yen, Ting. (1999). Method of forming robust interconnect and contact structures in a (U.S. Patent No. 5861676). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5861676
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile