The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 19, 1999
Filed:
Dec. 20, 1996
William E Horne, Renton, WA (US);
Mark D Morgan, Kent, WA (US);
Other;
Abstract
A method of fabricating a resonant micromesh filter having conductive antenna elements sized on the order of microns. The steps comprise of first creating an exposure mask having absorbing portions capable of stopping incident ions completely and transmitting portions incapable of stopping incident ions and through which incident ions can pass. The absorbing and transmitting portions form in the mask in the pattern of the antenna elements to be fabricated. Second, an exposure mask confronting an unpatterned filter is positioned. The unpatterned filter includes: a substrate, a thin metal foil mounted on the substrate, and a resist material covering the metal flow. Third, ions are passed through the exposure mask. The absorbing portions of the mask stop the ions and the transmitting portions allow the ions to pass through the mask and expose the section of the resist material of the filter in the pattern of the antenna elements. Fourth, the exposure mask is repositioned over an area of the unpatterned filter not previously exposed to incident ions. The third step is repeated. Then fourth step is repeated until a desired surface area of the unpatterned filter has been exposed. Last, the exposed unpatterned filter is processed to produce a conductive antenna array supported by a substrate.