The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 19, 1999

Filed:

Apr. 23, 1997
Applicant:
Inventors:

Lawrence J Heaslip, Burlington, CA;

James D Dorricott, Burlington, CA;

Assignee:

PSC Technologies, Inc., King Of Prussia, PA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B22D / ;
U.S. Cl.
CPC ...
266 45 ; 75584 ; 222590 ; 222594 ; 266229 ; 266275 ;
Abstract

A chamber for receiving a downward flow of liquid metal includes a generally horizontal base having a generally planar impact surface. A first faceted sidewall having a plurality of facets formed therein, generally extends upwardly from and encompasses the planar surface to define an interior space. The interior space has an upper opening for receiving the downward flow of liquid metal. A second wall extends inwardly and upwardly from the first faceted wall toward the upper opening. A plurality of buttresses are spaced along the first faceted wall. Each of the buttresses extends between the impact surface and the second faceted wall. The buttresses form a plurality of discrete pockets including at least one facet. The pockets are defined by the buttresses, the impact surface, the first faceted wall and the second wall. The buttresses laterally deflect and divide the radial outward flow into a plurality of discrete flow patterns associated with the plurality of pockets.


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