The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 1999
Filed:
Mar. 14, 1997
Kyeong-koo Chi, Kyungki-do, KR;
Samsung Electronics Co., Ltd., Suwon, KR;
Abstract
A radio frequency (RF) generating system for forming pulse plasma utilizes a plasma reaction device comprises a function generator, an amplifier, and an input port. The function generator generates a signal of time-modulated RF power according to a modulation function having a waveform, wherein the waveform gradually ascends at a rising edge and gradually descends at a falling edge. The input port receives the signal from the function generator and transmits the signal to the amplifier. The amplifier amplifies the signal to a predetermined level and then transmits the amplified signal to the plasma reaction device. A method for forming pulse plasma comprises the steps of generating a time-modulated RF power signal according to a modulation function having a waveform, wherein the waveform is shaped to gradually ascend at a rising edge and to gradually descend at a falling edge, amplifying the time-modulated RF power signal to a predetermined level, and transmitting the amplified time-modulated RF power signal to a plasma reaction device. In an embodiment of the present invention, the waveform is a half sine waveform, though other suitable waveforms include a half cosine waveform and a Gaussian pulse signal.