The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 1999
Filed:
Oct. 24, 1997
Applicant:
Inventors:
O Sung Kwon, Ichonkun, KR;
Doo Hee Lee, Ichonkun, KR;
Hyung Sun Yook, Ichonkun, KR;
Heung Gee Hong, Ichonkun, KR;
Young Mo Goo, Ichonkun, KR;
Assignee:
Hyundai Electronics Industries Co., Ltd., Kyoungkido, KR;
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430 30 ; 4302701 ;
Abstract
A method for forming photoresist patterns by performing a photolithograpy process by the unit of a predetermined number of wafers, wherein the photoresist patterns are formed under a condition that an exposure time taken to fore each of the photoresist patterns is predetermined taking into consideration a variation in reflection factor, on the basis of the following equation: