The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 1999
Filed:
May. 20, 1997
Applicant:
Inventor:
Ricardo Castillo, Arlington Heights, IL (US);
Assignee:
UOP LLC, Des Plaines, IL (US);
Primary Examiner:
Int. Cl.
CPC ...
C10G / ;
U.S. Cl.
CPC ...
208101 ; 208 95 ; 208113 ; 208 47 ; 208 / ;
Abstract
Wash water is used to remove impurities such as hydrogen sulfide, ammonia, and hydrogen cyanide from light hydrocarbons and gases derived from refinery fluid catalytic cracking operations. The present invention is a process of low pressure recirculation of wash water combined with low pressure removal of waste water which results in the efficient removal of the above impurities at significantly reduced wash water rates.
Castillo, Ricardo. (1999). Process for improved water wash in fcc gas concentration units (U.S. Patent No. 5858206). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5858206
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile