The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 05, 1999

Filed:

Apr. 25, 1997
Applicant:
Inventors:

Weiping Wang, Schenectady, NY (US);

Michael Evans Graham, Slingerlands, NY (US);

John Knox Hinds, Glenville, NY (US);

Garth M Nelson, Ballston Lake, NY (US);

Assignee:

General Electric Company, Schenectady, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K / ; G06K / ; G09G / ;
U.S. Cl.
CPC ...
382154 ; 382193 ; 345425 ;
Abstract

This invention discloses a system and method for measuring and monitoring three-dimensional shaped objects with projections of computer models of the objects. The computer models of the three-dimensional shaped objects are in the form of grid patterns. An image of the computer model of grid patterns is simultaneously projected from a dual projection system in two directions onto a real world instance of the object. Any variation between the computer model and the real world instance of the object is highlighted directly on the object by interference patterns of the two projections on the real world instance. The variation is quantified by counting the number of interference patterns on the real world instance of the object.


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