The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 05, 1999
Filed:
Sep. 02, 1997
Bruce Alvin Gurney, Santa Clara, CA (US);
Harry Jonathon Mamin, Palo Alto, CA (US);
Daniel Rugar, Los Altos, CA (US);
Virgil Simon Speriosu, San Jose, CA (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
An atomic force microscope (AFM) uses a spin valve magnetoresistive strain gauge formed on the AFM cantilever to detect deflection of the cantilever. The spin valve strain gauge operates in the absence of an applied magnetic field. The spin valve strain gauge is formed on the AFM cantilever as a plurality of films, one of which is a free ferromagnetic layer that has nonzero magnetostriction and whose magnetic moment is free to rotate in the presence of an applied magnetic field. In the presence of an applied stress to the free ferromagnetic layer due to deflection of the cantilever, an angular displacement of the magnetic moment of the free ferromagnetic layer occurs, which results in a change in the electrical resistance of the spin valve strain gauge. Electrical resistance detection circuitry coupled to the spin valve strain gauge is used to determine cantilever deflection.