The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 05, 1999

Filed:

Nov. 25, 1996
Applicant:
Inventors:

Tsutomu Takahashi, Ibaraki, JP;

Tatsuo Tateno, Ibaraki, JP;

Yoshifumi Tsujimoto, Ibaraki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G / ; C08G / ; B32B / ; B29C / ;
U.S. Cl.
CPC ...
528310 ; 528312 ; 528315 ; 528322 ; 5283291 ; 528332 ; 528335 ; 528336 ; 524600 ; 524606 ; 524607 ; 4284745 ; 264555 ; 264557 ; 264561 ; 264562 ;
Abstract

A para-oriented polyamide porous film comprising a fibril having a diameter of not more than 1.mu., with fibrils planarly arranged as a network or nonwoven fabric and laminated in a layer, the thermal linear expansion coefficient at 200.degree.-300.degree. C. within .+-.50.times.10.sup.-6 /.degree.C. and 30-95% vacant spaces. Also, a battery separator using the porous film. Also, a production process of: (a) forming a film-like material from a solution containing 1-10% of a para-oriented aromatic polyamide having an inherent viscosity of 1.0-2.8 dl/g and 1-10% of a chloride of an alkali metal or an alkali earth metal in a polar amide or polar urea solvent; (b) maintaining the film-like material at not less than 20.degree. C. and not more than -5.degree. C. to deposit the para-oriented aromatic polyamide; and (c) immersing the film-like material in an aqueous or alcoholic solution to elute the sovlent and chloride of the alkali metal or alkali earth metal, then drying to obtain the para-oriented aromatic polyamide porous film. The film has uniformity and fine vacant spaces, which cannot be accomplished by a nonwoven fabric. Characteristics of a para-aramid (e.g., high heat resistance, high rigidity, high strength, etc.) are used.


Find Patent Forward Citations

Takahashi, Tsutomu. (1999). Para-oriented aromatic polyamide porous film (U.S. Patent No. 5856426). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5856426

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