The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 05, 1999

Filed:

Oct. 24, 1997
Applicant:
Inventors:

Kwok Pong Chan, Troy, NY (US);

Kevin R Stewart, Schenectady, NY (US);

Janet L Gordon, Clifton Park, NY (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C08G / ; C08G / ; C08G / ;
U.S. Cl.
CPC ...
528125 ; 528174 ; 528185 ; 528190 ; 528201 ; 528220 ; 526257 ; 526259 ; 526260 ; 526261 ; 526284 ; 526333 ; 526334 ;
Abstract

Optically active poly(aryl)ether polymers prepared from monomers containing optically pure spirobiindane and/or indane moieties are disclosed. The chiral poly(aryl)ether polymers are of high molecular weight and exhibit high optical rotations. In addition, the polyethers are thermally stable at high temperatures and exhibit excellent hydrolytic resistance making them useful in high temperature processing applications, in the fabrication of optoelectronics devices, and as polarizing coatings and filters.


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