The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 05, 1999
Filed:
Apr. 23, 1997
Barry W Manley, Boulder, CO (US);
Sierra Applied Sciences, Inc., Boulder, CO (US);
Abstract
Plasma processing apparatus may comprise a process chamber having a process gas supply for providing a process gas to the process chamber and a vacuum pump for maintaining the process chamber within a predetermined pressure range. A cathode/target assembly positioned within the process chamber is connected to a first terminal of an external power supply. An anode/ion source assembly is also positioned within the process chamber and may include an electrode member having a central aperture therein that defines an active surface on the electrode member. The electrode member is connected to a second terminal of the external power supply. A magnet positioned adjacent the electrode member produces an electron-confining magnetic tunnel adjacent the active surface of the electrode member. The electron-confining magnetic tunnel momentarily traps electrons adjacent the active surface, some of which ionize some of the process gas. A shield member having a central aperture therein surrounds the electrode member so that the central aperture of the shield member is generally aligned with the central aperture in the electrode member. The shield member is electrically insulated from the electrode member.