The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 05, 1999
Filed:
Apr. 30, 1997
Angel Sanjurjo, San Jose, CA (US);
Kai-Hung Lau, Cupertino, CA (US);
David M Lowe, Hayward, CA (US);
Liqiang Jiang, San Jose, CA (US);
SRI International, Menlo Park, CA (US);
Abstract
A fluidized-bed reactor for the chemical vapor deposition of a coating on a substrate surface is described. The reactor enables high rates of deposition and a highly homogeneous coating by modifying the boundary layer formed between the gasified reactive gas stream and the substrate. The boundary layer is minimized by the presence of an exhaust outlet placed in close proximity to the center of the surface of the substrate and/or the presence of a gas inlet capable of injecting a tangential stream of gas which results in a swirling radial flow of reactive gas. Methods of forming a metal coating on a surface of a substrate using the reactor are provided as well.