The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 05, 1999

Filed:

Sep. 26, 1997
Applicant:
Inventors:

Karl Lohmueller, Hampstead, NH (US);

Moshe Rock, Andover, MA (US);

Douglas Lumb, Metheun, MA (US);

Assignee:

Malden Mills Industries, Inc., Lawrence, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
D04B / ; D04B / ; D06C / ;
U.S. Cl.
CPC ...
66196 ; 28162 ;
Abstract

A method of constructing a double face fabric is provided. The first step in the method is to knit a three dimensional knit fabric which has a first fabric layer, a second fabric layer and a plurality of yarns that interconnect the two layers. The three dimensional knit fabric is prepared using a conventional double needle bar warp knitting machine. Then, the yarn connecting the two layers is cut, resulting in two pieces of fabric having a velvet surface on one side, and a flat knit surface on the other. The flat knit surface is then raised by a process such as napping to pull portions of the pile yarns through the fabric layer to the technical back, in order to form a pair of double face fabrics, each with a first velvet surface and a second fleece surface. Preferably, the fabric is knit so that after napping it can be stretched. In this manner a wide variety of fabrics can be created.


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Lohmueller, Karl. (1999). Method for constructing a double face fabric and fabric produced thereby (U.S. Patent No. 5855125). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5855125

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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