The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 29, 1998

Filed:

Jul. 14, 1997
Applicant:
Inventors:

Kenji Adachi, Chiba, JP;

Atsushi Yamanaka, Ichikawa City, JP;

Atsushi Toufuku, Ichikawa City, JP;

Sadahiro Iida, Narashino City, JP;

Masaya Yukinobu, Niihama City, JP;

Keiichi Orita, Oyama City, JP;

Hiroko Inage, Inzai-machi, JP;

Hiromitsu Takeda, Ichikawa City, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B / ;
U.S. Cl.
CPC ...
428325 ; 428331 ; 428428 ; 428432 ; 428446 ;
Abstract

A thin conductive film which excels in film strength, weather resistance, transparency, and electric field shielding effect is formed on a glass substrate at a low temperature as a multilayer film which is formed of an ITO-dispersed silicate layer and an overcoat silicate layer, or at least two layers of an ITO dispersed silicate and a high-conductivity oxide-dispersed silicate, and a topmost layer of an overcoat silicate. The ITO dispersed silicate layer includes ultra fine particles of indium tin oxide and a silicate-based glass matrix, and the high-conductivity oxide-dispersed silicate layer consists of includes ultra fine particles selected from the group of ruthenium dioxide, rhenium trioxide, iridium dioxide, rhodium dioxide and irridium-based pyrochlore and a silicate-based glass matrix.


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