The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 29, 1998

Filed:

Feb. 11, 1997
Applicant:
Inventors:

John S Chambers, Rochester, NY (US);

Bryan M Knauss, Webster, NY (US);

Huoy-Jen Yuh, Pittsford, NY (US);

Robert T Cosgrove, Rochester, NY (US);

Assignee:

Xerox Corporation, Stamford, CT (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
4274301 ; 427230 ;
Abstract

A method including: (a) positioning a hollow substrate having a first end and an open second end in a solution, wherein the open second end is submerged in the solution, wherein gas is present in the hollow portion of the substrate between the solution and the first end, thereby defining a quantity of trapped gas molecules; (b) removing the substrate from the solution; and (c) changing the quantity of the trapped gas molecules by (i) withdrawing a portion of the trapped gas molecules, or (ii) introducing additional gas molecules into the hollow portion, wherein (i) and (ii) are accomplished through the second end of the substrate, thereby controlling the pressure of the gas in the hollow portion.


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