The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 29, 1998
Filed:
Aug. 28, 1996
William R Erickson, Lakeland, FL (US);
Other;
Abstract
High purity silica is obtained by the reaction of impure by-product waste silica with hydrogen fluoride preferably in the presence of water or sulfuric acid, producing silicon tetrafluoride gas and a mother liquor. The silicon tetrafluoride is separated from the mother liquor, which retains the impurities originally contained within the impure silica. The silicon tetrafluoride gas is contacted with high-purity water, in a clean environment, to form a slurry of high purity silica and high-purity hydrofluosilicic acid (FSA). A portion of the silica is filtered from the slurry and washed producing a high purity silica product. The rest of the silica-FSA slurry is preferably reacted with ammonia to form a slurry of ammonium fluoride and silica. The silica is separated from the ammonium fluoride and preferably washed and calcined to remove any remaining ammonium fluoride, leaving additional high purity silica product. The separated ammonium fluoride may be reacted with lime to produce additional products for recycling back into the process. The process can be repeated for further purification of the silica. The process may be used to produce substantially spherical silica particles about 1.0 to about 25.0 microns in diameter.