The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 29, 1998
Filed:
Jun. 19, 1997
Sang Yong Kim, Kyungki-Do, KR;
Hyundai Electronics Industries, Co., Ltd., Kyungki-Do, KR;
Abstract
The present invention discloses a method of planarizing an insulating layer of a semiconductor device. The method of the present invention comprises a first polishing step for rotating the platen and the rotating carrier holding the wafer contacted with the polishing pad secured to the platen, applying a nitrogen (N.sub.2) gas to the rear surface of the wafer to contact a surface of the wafer with the polishing pad, and applying force to the wafer through the rotating carrier to press the wafer against the polishing pad. Then, a second polishing step for increasing a speed of revolution of the platen and the rotating carrier and decreasing the force applied to the wafer is performed.