The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 22, 1998
Filed:
Mar. 26, 1997
Applicant:
Inventors:
Detlef Heindl, Weinbach, DE;
Albert Erdrich, Bad Nauheim, DE;
Assignee:
Heraeus Kulzer GmbH, Hanau, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08K / ;
U.S. Cl.
CPC ...
524492 ; 524493 ; 524494 ; 523115 ; 523217 ; 523116 ; 523117 ; 501 39 ;
Abstract
Porous silicon dioxide glass is proposed as an inorganic filler for polymerizable materials, which has a particle size of 0.5-50 micrometers, a pore size of 20-120 nanometers, a pore volume of 200-1000 mm.sup.3 /g and a BET surface area of 10-100 m.sup.2 /g. The polymer products containing the filler are characterized by a very good resistance to abrasion.