The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 22, 1998
Filed:
Apr. 11, 1995
Applicant:
Inventors:
Mutsumi Inamatsu, Hiroshima, JP;
Takashi Matsuzaki, Hiroshima, JP;
Katsutoshi Yoshizato, Hiroshima, JP;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C12N / ;
U.S. Cl.
CPC ...
435383 ; 435373 ; 435384 ;
Abstract
This invention provides a method for culturing dermal papilla cells with at least either of the mammalian epidermal cells from the sole or other portions of a mammal and the conditioned medium thereof, in order to permit long stable subculture of dermal papilla cells while keeping the original function thereof intact.