The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 22, 1998
Filed:
Sep. 12, 1997
Applicant:
Inventors:
Lydia J Young, Palo Alto, CA (US);
Richard H Matthiesen, Scotts Valley, CA (US);
Simon Selitser, Fremont, CA (US);
Ron van Os, Sunnyvale, CA (US);
Assignee:
Watkins-Johnson Company, Palo Alto, CA (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ; C23C / ;
U.S. Cl.
CPC ...
118715 ; 20429807 ; 156345 ;
Abstract
A system for injecting a gaseous substance into a semiconductor processing chamber. The injection system includes at least one plenum formed in a plenum body and a plurality of nozzles associated with each plenum for injecting gaseous substances from the plenums into the chamber. A conduit structure transports gaseous substances along an indirect path from the plenum to the nozzles. The nozzles are positioned and configured to provide a uniform distribution of gaseous substances across the wafer surface.
Published as:
WO9715698A1; AU7450596A; EP0870072A1; CN1200773A; US5851294A; TW356554B; KR19990066993A; HK1015420A1; JPH11514499A; EP0870072A4; CN1115425C; EP0870072B1; ATE275213T1; DE69633295D1; KR100434749B1;