The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 22, 1998

Filed:

Nov. 20, 1996
Applicant:
Inventors:

Shogo Sato, Miyagi, JP;

Osamu Maniwa, Miyagi, JP;

Assignee:

Sony Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05C / ;
U.S. Cl.
CPC ...
118411 ; 118419 ;
Abstract

An applicator in which a coating can be applied to a base material at high speed, a coating film can be thinned and a desired coating film can be obtained when the coating films of two or more layers are simultaneously formed. A die 2 is provided with a slit 5 for a lower layer and a slit 15 for an upper layer which respectively serve to extrude a coating 6 for the lower layer and a coating 16 for the upper layer to the base material. The coatings 6 and 16 are respectively extruded from these slits 5 and 15 to the continuously running base material 1 so that the coating films of two layers are formed. Lower layer lips 4 forming the lower layer slit 5 are provided so as to be not in contact with the base material 1. Upper lips 14 forming the upper layer slit 15 are provided so as to abut on the base material 1. When a magnetic coating is used as the coating 6 for the lower layer, a magnet part may be opposed to the lips 4 for the lower layer by sandwiching the base material 1 therebetween.


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