The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 15, 1998
Filed:
Feb. 10, 1997
Shuta Hamada, Hachioji, JP;
Satoshi Haneda, Hachioji, JP;
Hisayoshi Nagase, Hachioji, JP;
Hiroyuki Tokimatsu, Hachioji, JP;
Masahiro Onodera, Hachioji, JP;
Toshihide Miura, Koganei, JP;
Konica Corporation, Tokyo, JP;
Abstract
An image forming apparatus having an exposure optical system provided with an exposure light source in which light-emitting elements are arranged on a base plate to be line-shaped and with a lens array of a distributed refractive index type that converges a beam emitted from the exposure light source on the surface of a photoreceptor and conducts imagewise exposure. The apparatus is configured to satisfy the expression: ##EQU1## In the expression, .DELTA.T1 represents a variation width (K) of the temperature in the vicinity of light-emitting elements, R represents a radius of the photoreceptor mentioned above, Ri represents a length (.mu.m) of each member constituting the exposure optical system in the radial direction of the photoreceptor, .alpha. represents a coefficient of linear thermal expansion (.degree.C..sup.-1) of a transparent base that forms the photoreceptor, .alpha.i represents a coefficient of linear thermal expansion (.degree.C..sup.-1) of each member that constitute the exposure optical system, and F represents the depth of focus (.mu.m) of the lens array.