The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 15, 1998
Filed:
Jul. 01, 1997
Hermann Kloberdanz, Linsengericht-Geislitz, DE;
Josef Hoffmann, Worth am Main, DE;
Jurgen Henrich, Limeshain, DE;
Leybold Systems GmbH, Hanau, DE;
Abstract
In a vacuum treatment system for applying thin layers to substrates (2, 2', . . . ) such as headlight reflectors, with several treatment (8, 9, 10) and/or inward and outward transfer lock stations (20) supported on a stationary vacuum chamber wall (16, 16', . . . ) and with a rotatably supported internal cylinder (14), which is enclosed by the vacuum chamber wall and carries the substrate chambers (3-6), openings (24-27) are provided in the vacuum chamber wall (16, 16', . . . ), with which the substrate chambers (3-6) can be aligned and through which the treatment agents can be allowed to act on the substrates (2, 2', . . . ) and/or through which the substrates can be transferred in and out, where one of the substrate chambers, but at least the inward/outward transfer lock chamber (20), has as cover or a sealing flap (33), which allows direct access to the corresponding substrate chamber, and where the chamber (20) can be shifted (A, B) toward the internal cylinder (14) and pressed against the outside wall of the cylinder (14) or against the frame-like end surface of the substrate chamber (3).