The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 08, 1998

Filed:

Jul. 03, 1996
Applicant:
Inventors:

Marc Finot, Somerville, MA (US);

Olivera Kesler, Cambridge, MA (US);

Subra Suresh, Wellesley, MA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01L / ;
U.S. Cl.
CPC ...
73812 ; 73800 ;
Abstract

A technique for determining properties such as Young's modulus, coefficient of thermal expansion, and residual stress of individual layers within a multi-layered sample is presented. The technique involves preparation of a series of samples, each including one additional layer relative to the preceding sample. By comparison of each sample to a preceding sample, properties of the topmost layer can be determined, and residual stress at any depth in each sample, resulting from deposition of the top layer, can be determined.


Find Patent Forward Citations

Finot, Marc. (1998). Method and apparatus for the evaluation of a depth profile of (U.S. Patent No. 5847283). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5847283

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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