The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 01, 1998
Filed:
Aug. 15, 1997
Kabushiki Kaisha, TOPCON, Tokyo, JP;
Abstract
An objective refraction measuring system of an ophthalmic apparatus measures a refractive power of an eye to be examined in an objective manner under the condition that a gazing chart of a gazing target system is fixed to the eye to be examined. An arithmetic-logic unit obtains an objective measurement value of the eye to be examined on the basis of the measurement result by the objective refraction measuring system and the gazing target system. A control unit controls a continuous objective measurement while fogging the gazing chart after setting the gazing chart of the gazing chart system to a far-sight position of the eye to be examined which is obtained by using the gazing target system. With such measurement, the continuous objective measurement values by fogging the gazing chart of the gazing target system is obtained from the far-sight position based upon the objective measurement of the eye to be examined. Thus, the limit of the adjustment force of the eye to be examined is precisely measured.