The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 01, 1998

Filed:

Oct. 03, 1995
Applicant:
Inventors:

Masamichi Saito, Inagi, JP;

Katsuyoshi Kohno, Yokohama, JP;

Bunryo Sato, Hachiohji, JP;

Yasuto Kodera, Fujisawa, JP;

Kazuhiro Aoyama, Atsugi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F / ;
U.S. Cl.
CPC ...
349126 ;
Abstract

A rubbing treating apparatus, comprising: a stage for mounting thereon an electrode substrate provided with an alignment control film, a rubbing cloth for effecting rubbing treatment by rubbing it against the alignment control film, a rubbing mask mounted on the stage so as to cover at least a part of the electrode substrate, and a holding means for causing at least the rubbing mask to closely contact the stage, wherein the rubbing mask is caused to closely contact the stage at the time of rubbing treatment. The rubbing mask is effective in imparting an alignment control power to the surface of the alignment control film, effecting uniform rubbing treatment with respect to a desired region and preventing an occurrence of alignment defects and a deterioration of the rubbing cloth.


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