The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 01, 1998
Filed:
Jan. 31, 1997
Samuel M Babb, Ft. Collins, CO (US);
Lowell E Kolb, Loveland, CO (US);
Hewlett-Packard Company, Palo Alto, CA (US);
Abstract
The degree of variation in the normalized site attenuation of an RF test chamber may be reduced by adjusting the properties of the RF absorbers lining the walls of the RF test chamber such that for the frequencies of greatest variation the ground screen formed by the conductive floor of the chamber appears to be much greater than its actual finite size. This may be done by progressively reducing the degree of chamber wall absorption (for the frequencies of interest) for locations on the walls closer to the floor. The reduction begins at a height above the floor equal to the height of the device under test above the floor, and proceeds to some maximum reduction in absorption at the level of the floor. The reduction in absorption has the effect of making the ground screen appear to be much larger than it really is, and may be obtained either by spacing the absorbing tiles apart by increasing amounts nearer to the floor, or by using less absorptive tiles closer to the floor, or both.