The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 01, 1998
Filed:
May. 16, 1995
Hiroshi Nomura, Shorewood, MN (US);
Jong Hyung Ahn, Minnetonka, MN (US);
NeoMecs Incorporated, St. Louis Park, MN (US);
Abstract
Improved porous materials useful in blotting analyses of proteinaceous and genomic matter are prepared by treating porous substrates with a gas plasma containing at least one monomer. Thus, a porous sheet-like substrate is modified by means of a deposit of a plasma polymerizate on at least one of its surfaces, whereby this modified surface exhibits reduced nonspecific binding of chemical probes in a blotting analysis. By means of a controlled deposition of the plasma polymer at a plasma composite parameter W/FM of less than 1.0.times.10.sup.9 Joules/kilogram, improved porous materials are obtained having increased signal-to-background ratios and enhanced sensitivities in genomic analyses. In a particularly preferred embodiment, a porous, positively charged nylon membrane is treated with a plasma containing an unsaturated carboxylic acid monomer, whereby the membrane surface is modified with an acidic polymeric deposit, this modification resulting in reduced nonspecific binding of oligonucleotide probes and increased sensitivity in chemiluminescent analyses of polynucleotide sequences.