The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 01, 1998
Filed:
Apr. 19, 1994
Applicant:
Inventors:
Assignee:
Olympus Optical Company, Ltd., Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29D / ;
U.S. Cl.
CPC ...
216 26 ; 216 24 ; 216 89 ; 216 97 ; 65 31 ; 65 61 ; 65102 ; 65111 ;
Abstract
Methods of manufacturing optical elements such as diffraction type lenses, aspherical lenses and diffraction gratings are disclosed. Deposited on a glass substrate is a workpiece film made of a material which can be machined much more easily than the substrate. Then the workpiece film is machined to form a predetermined shape or contour therein. After forming the predetermined shape or contour in the workpiece film, the workpiece film and substrate are subjected to etching to duplicate the predetermined shape or contour formed in the workpiece film into the substrate.